Electrodeposition agent for positive photoresist for microfabrication 'Hani Resist AP'
A photoresist-type electrodeposition agent suitable for fine processing of electronic components and similar applications!
"Hani Resist AP" is a fine processing positive-type resist electrocoating agent developed based on the electrocoating technology for aluminum building materials (electrocoating resin synthesis technology, electrocoating liquid management technology, electrocoating process technology) that Honey Kasei has cultivated over many years and pioneered globally. It enables high-speed processing (film formation possible in 10 seconds of current application) and fine processing for printed circuit boards and COF/TCP using a Reel to Reel method. It also excels in processing capabilities within through-holes, making it easy to form coatings on three-dimensional structures. 【Features】 ■ High-speed processing ■ High resolution ■ Uniform coating thickness ■ Alkaline development, alkaline stripping type *For more details, please refer to the catalog or feel free to contact us.
- Company：ハニー化成
- Price：Other
